Offering the promise of silicon photonics, ART could open the door to faster speeds than today’s technology allows.
 
     
    Strained silicon performance enhancements increase processing speed and reduce power consumption.
 
 

Sen. John E. Sununu to Commend AmberWave Systems and University of
New Hampshire for Receiving Technology Innovation Grant from the
New Hampshire Innovation Research Center

Senator and Grant Recipients to Discuss Importance of Technology Growth,
Innovation and NH Economy During Event on Monday, January 14

Salem, N.H. – January 9, 2008 – AmberWave Systems, a leader in the research, development and licensing of advanced technologies for semiconductor manufacturing, will be partnering with the University of New Hampshire (UNH), after the two institutions were named as recipients of the “Granite State Technology Innovation Grant” by the New Hampshire Innovation Research Center (NHIRC).

To kick-off the alliance, AmberWave Systems will host Sen. John E. Sununu, N.H., as well as members from UNH, at their company headquarters in Salem, N.H. beginning at 8:30 am. on Monday, Jan. 14, 2008. During the event, Sen. Sununu, along with AmberWave Systems’ Richard Faubert, president and CEO, and UNH representatives, will speak about technology innovation, the UNH partnership, as well as the Senator’s continued support for emerging technology institutions. Local media are invited to attend the event.

The grant will help support the project “Cost Effective Nano-Patterning for Aspect Ratio Trapping Technology.” Aspect Ratio Trapping (ART), a technique developed and nurtured by AmberWave Systems. ART is a technology that focuses on integrating silicon and compound semiconductors. It could allow manufacturers to capitalize on investments in current manufacturing technologies, and improve the speed and functionality of many of the technology devices and gadgets used everyday by consumers, while at the same time, considerably reducing costs.

“One of the fundamental and critical issues to this ART technology is the cost of patterning the silicon substrate suitable for ART material growth,” said Dr. Anthony Lochtefeld, AmberWave’s vice president of research. “We chose to work with Dr. Glen Miller because he has developed several methods for the high-rate directed assembly of nanoelements at UNH. We believe that his innovative and cost-effective approaches may help us to achieve a more efficient ART technology.”

Dr. Glen P. Miller, a professor in the department of chemistry and materials science program at UNH, will lead the grant project at the university. Dr. Miller also serves as the associate director of the Center for High-rate Nanomanufacturing at UNH. The project will allow him, as well as his students, to transition from cutting-edge research to real world applications.

“Our partnership with AmberWave represents an opportunity to apply fundamental research that originated at UNH to real problems in the semiconductor industry,” said Dr. Miller. “This is a marriage between research excellence at UNH and semiconductor experience and expertise at AmberWave. It's a win-win.”

About AmberWave Systems
Founded in 1998, AmberWave Systems has become a leader in the research, development and licensing of advanced technologies for semiconductor manufacturing. By funding and guiding university research, AmberWave Systems is bringing new technology developments to fruition through patents and technology licensing. In conjunction with its university research projects, AmberWave Systems conducts its own research, development and limited manufacturing in its semiconductor fabrication facility in Salem, New Hampshire. In addition, AmberWave Systems collaborates with other technology focused companies to further expand and develop its research. For more information about the company, please visit its Web site at www.amberwave.com.